Changzhou Junhe Technology Stock Co.,Ltd
| Supply Ability | 2 Tons per Day |
| Delivery Time | Ten days after receipt of advance payment |
| Packaging Details | 1000kg/barrel |
| Name | Silicon Wafer Cleaning |
| Application | IT Industry |
| PH | 12.0-14.0 |
| Free alkalinity(piont) | ≧13.5mg |
| name | si wafer cleaning |
| model | 1020 |
| Brand Name | JUNHE |
| Model Number | 1020 |
| Certification | ISO9001 TS16949 SGS |
| Place of Origin | Changzhou in china |
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Product Specification
| Supply Ability | 2 Tons per Day | Delivery Time | Ten days after receipt of advance payment |
| Packaging Details | 1000kg/barrel | Name | Silicon Wafer Cleaning |
| Application | IT Industry | PH | 12.0-14.0 |
| Free alkalinity(piont) | ≧13.5mg | name | si wafer cleaning |
| model | 1020 | Brand Name | JUNHE |
| Model Number | 1020 | Certification | ISO9001 TS16949 SGS |
| Place of Origin | Changzhou in china | ||
| High Light | Silicon Slice Detergent ，Industrial Chemical Cleaning | ||
IT Industry Silicon Wafer Cleaning With Good Degreasing Performance
The RCA clean process is based on a cleaning method developed at RCA Corporation to remove organic residue from silicon wafers. The cleaning solution is made up of 5 parts water, 1 part 27% ammonium hydroxide and 1 part 30% hydrogen peroxide. It removes organic contaminants and leaves a thin layer of oxidized silicon on the surface of the wafer.
Silicon Wafer Cleaning feature
1) single group products with perfect PPR(performance price ratio)
2) be free from calcium, magnesium, metal, copper, lead and phosphor, and meet the requirement of ROHS.
3)good degreasing performance to meet the requirement of high-accuracy IT area.
Silicon Wafer Cleaning technical parameter
| classification project | JH-1020 Silicon Wafer Cleaning | Test Standard |
| Appearance | Colorless to yellowish liquid | visualization |
| Specific weight | 1.01-1.25 | densimeter |
| pH | 12.0-14.0 | PH instrument |
| free alkalinity(piont) | ≧13.5mg | CYFC |
Silicon Wafer Cleaning instructions
1) put pure water into cleaning tank till three-quarter, then, add agent in 3% -5% concentration, add water till working level, last, heat the bath solution till working temperature.
2) need to change bath solution completely after degreasing certain amount silicon slice.
3) reduce exposed time in air to avoid oxidation.
4) working temperature 50-65 degree, disposal time: 2-5minutes.
Company Details
Business Type:
Manufacturer
Year Established:
1998
Total Annual:
1300-1500
Employee Number:
200~250
Ecer Certification：
Verified Supplier
Changzhou Junhe Technology Stock Co., Ltd. is a high-tech enterprise devoted to developing industrial fine chemicals, special equipment and services solution provider which was founded in Changzhou, Jiangsu in 1998. Zinc flake microlayer corrosion protection coating is one of our core p... Changzhou Junhe Technology Stock Co., Ltd. is a high-tech enterprise devoted to developing industrial fine chemicals, special equipment and services solution provider which was founded in Changzhou, Jiangsu in 1998. Zinc flake microlayer corrosion protection coating is one of our core p...
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