Baoji Feiteng Metal Materials Co., Ltd.
| Payment Terms | T/T |
| Supply Ability | To be negotiated |
| Delivery Time | To be negotiated |
| Packaging Details | Vaccum package in wooden case |
| Size | φ150*φ123*1091mm |
| Steel grade | 304 |
| Welding line type | Seamless |
| Packaging | Vaccum package |
| Brand Name | Feiteng |
| Model Number | Stainless Steel Tube Target |
| Certification | GB/T19001-2016 idt ISO9001:2015 MANAGEMENT SYSTEM CNAS C034-M |
| Place of Origin | Baoji, Shaanxi, China |
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Product Specification
| Payment Terms | T/T | Supply Ability | To be negotiated |
| Delivery Time | To be negotiated | Packaging Details | Vaccum package in wooden case |
| Size | φ150*φ123*1091mm | Steel grade | 304 |
| Welding line type | Seamless | Packaging | Vaccum package |
| Brand Name | Feiteng | Model Number | Stainless Steel Tube Target |
| Certification | GB/T19001-2016 idt ISO9001:2015 MANAGEMENT SYSTEM CNAS C034-M | Place of Origin | Baoji, Shaanxi, China |
| High Light | 123mm Stainless Steel Targets ，High Density Stainless Steel Targets ，OD150 Stainless Steel Targets | ||
OD150*ID123*1091 Stainless Steel 304 Stainless Steel Tube Target
| Product | Stainless Steel Tube Target |
| Size | φ150*φ123*1091 |
| Grade | Titanium Gr5 |
| Packaging | Wooden case |
| Port of delivery | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
Target materials in the semiconductor industry. Semiconductor materials can be divided into wafer materials and packaging materials. Packaging materials have lower technical barriers compared with wafer manufacturing materials. There are seven types of semiconductor materials and chemicals involved in wafer production, one of which is sputtering target materials. The target material is one that is bombarded by high-speed charged particles. By changing different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), different film systems (such as superhard, wear-resistant, corrosion-resistant alloy films, etc.) can be obtained.
Purity is one of the main performance indexes of the target material, because the purity of the target material has a great influence on the performance of the film. But in practice, the purity requirements of target materials are also different. Impurities in solid materials and oxygen and water vapor in pores are the main sources of film deposition. In order to reduce the porosity of solid target material and improve the performance of sputtering film, the target material is usually required to have a high density. Density is also one of the key performance indexes of target materials. The density of the target material affects not only the sputtering rate but also the electrical and optical properties of the thin films. The higher the target density, the better the film forming performance. In addition, the density and strength of the target material can be improved by making the target material withstand thermal stress better during sputtering.
Company Details
Business Type:
Manufacturer,Exporter
Year Established:
2008
Total Annual:
10million-20million
Employee Number:
50~100
Ecer Certification：
Site Member
Company information Feiteng Metal Material Co., Ltd. was founded in 2008, is a collection of production, processing, sales, research and development as one of the high-tech comprehensive enterprise. After more than ten years of efforts, our company's production technology developmen... Company information Feiteng Metal Material Co., Ltd. was founded in 2008, is a collection of production, processing, sales, research and development as one of the high-tech comprehensive enterprise. After more than ten years of efforts, our company's production technology developmen...
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