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XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.

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China Undoped InSb Wafer , 2”, As - Cut Wafer , Mechanical Wafer , Or Polished Wafer
China Undoped InSb Wafer , 2”, As - Cut Wafer , Mechanical Wafer , Or Polished Wafer

  1. China Undoped InSb Wafer , 2”, As - Cut Wafer , Mechanical Wafer , Or Polished Wafer

Undoped InSb Wafer , 2”, As - Cut Wafer , Mechanical Wafer , Or Polished Wafer

  1. MOQ: 1-10,000pcs
  2. Price:
  3. Get Latest Price
Payment Terms T/T
Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days
Packaging Details Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere
product name Undoped Indium Antimonide InSb Wafer
Wafer Diamter 2″
Package Epi-Ready,Single wafer container or CF cassette
feature single crystal InSb Wafer
Wafer Thickness 625±25um
keyword Mechanical Wafer
Brand Name PAM-XIAMEN
Place of Origin China

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  1. Product Details
  2. Company Details

Product Specification

Payment Terms T/T Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days Packaging Details Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere
product name Undoped Indium Antimonide InSb Wafer Wafer Diamter 2″
Package Epi-Ready,Single wafer container or CF cassette feature single crystal InSb Wafer
Wafer Thickness 625±25um keyword Mechanical Wafer
Brand Name PAM-XIAMEN Place of Origin China
High Light indium antimonide waferas cut wafer

 
Undoped InSb Wafer, 2”, As-Cut Wafer, Mechanical Wafer, Or Polished Wafer
 

PAM-XIAMEN provides single crystal InSb(Indium Antimonide) wafer growth by Liquid Encapsulated Czochralski ( LEC ) method. Indium Antimonide (InSb) can be supplied as wafers with as-cut, etched or polished finishes and are available in a wide range of carrier concentration, diameter and thickness.PAM-XIAMEN can provide epi ready grade InSb wafer for your MOCVD & MBE epitaxial application .

 

Undoped InSb Wafer, 2”, As-Cut Wafer, Mechanical Wafer, Or Polished Wafer

Please contact our engineer team for more wafer information.

Wafer Specification
Item Specifications
Wafer Diameter

 

2″50.5±0.5mm
 

Crystal Orientation

 

2″(111)AorB±0.1°
 

Thickness

 

2″625±25um
 

Primary flat length

 

2″16±2mm
 

Secondary flat length

 

2″8±1mm
 

Surface Finish P/E, P/P
Package Epi-Ready,Single wafer container or CF cassette

 

Electrical and Doping Specification
Conduction Type n-type
Dopant Undoped
EPD cm-2 ≤50
Mobility cm² V-1s-1 ≥4*105
Carrier Concentration cm-3 5*1013-3*1014

 
Band structure and carrier concentration of InSb Wafer

Band structure and carrier concentration of InSb Wafer include Basic Parameters,Temperature, Dependences,Dependence of the Energy Gap on Hydrostatic Pressure, Effective Masses, Donors and Acceptors

Basic Parameters
Temperature Dependences
Dependence of the Energy Gap on Hydrostatic Pressure
Effective Masses
Donors and Acceptors

Basic Parameters

Energy gap 0.17 eV
Energy separation (EΓL) between Γ and L valleys 0.51 eV
Energy separation (EΓX) between Γ and X valleys 0.83 eV
Energy spin-orbital splitting 0.80 eV
Intrinsic carrier concentration 2·1016 cm-3
Intrinsic resistivity 4·10-3 Ω·cm
Effective conduction band density of states 4.2·1016 cm-3
Effective valence band density of states 7.3·1018 cm-3

 

Band structure and carrier concentration of InSb 300 K
Eg = 0.17 eV
EL = 0.68 eV
EX= 1.0 eV
Eso = 0.8 eV

Temperature Dependences

Temperature dependence of the energy gap

Eg = 0.24 - 6·10-4·T2/(T+500) (eV),
where T is temperatures in degrees K (0 < T < 300).
 

Effective density of states in the conduction band

Nc~ 8·1012·T3/2 (cm-3)

Effective density of states in the valence band

Nn ~ 1.4·1015·T3/2 (cm-3).

Intrinsic Carrier Concentration

ni = (Nc·Nν)1/2exp(-Eg/(2kbT))
For 200K < T < 800 K ni = 2.9·1011(2400 - T)3/4 ·(1+2.7·10-4·T)·T3/2 ·exp(-(0.129 - 1.5·10-4T)/(2kbT)) (cm-3)
 

The temperature dependences of the intrinsic carrier concentration.
Fermi level versus temperature for different concentrations of shallow donors and acceptors.

Dependences on Hydrostatic Pressure

Eg≈Eg(0) + 13.7·10-3P - 3.6·10-5P2 (eV)
EL≈EL(0) + 4.7·10-3P - 1.1·10-5P2 (eV)
EX≈EX(0) - 3.5·10-3P + 0.64·10-5P2 (eV),
where P is pressure in kbar.

Effective Masses

Electrons:  
For Γ-valley mΓ = 0.0.14mo
Non-parabolicity:
E(1+αE) = h2k2/(2mΓ)
α = 4.1 (eV-1)
In the L-valley effective mass of density of states mL=0.25mo

 

Electron effective mass versus electron concentration
 

 

Holes: mh = 0.43mo
Heavy mh = 0.43mo
Light mlp = 0.015mo
Split-off band mso = 0.19mo
Effective mass of density of states mv = 0.43mo

Donors and Acceptors

Ionization energies of shallow donors ~0.0007 (eV):

Se, S, Te.

Ionization energies of shallow acceptors (eV):

Cd Zn Cr Cu° Cu-
0.01 0.01 0.07 0.028 0.056

Are You Looking for an InSb substrate?

PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InSb wafers, send us enquiry today to learn more about how we can work with you to get you the InSb wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Exporter,Seller

  • Year Established:

    1990

  • Total Annual:

    10 Million-50 Million

  • Employee Number:

    50~100

  • Ecer Certification:

    Active Member

  Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...   Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...

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  • XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
  • #506B, Henghui Business Center, No.77, Lingxia Nan Road, High Technology Zone, Huli, Xiamen 361006, China
  • http://www.ganwafer.com/

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