China factories

China factory - XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.

XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.

  • China,Xiamen ,Fujian
  • Active Member

Leave a Message

we will call you back quickly!

Submit Requirement
China N Type , GaSb Crystal Wafer Substrate , 3”, Prime Grade, Epi-Ready
China N Type , GaSb Crystal Wafer Substrate , 3”, Prime Grade, Epi-Ready

  1. China N Type , GaSb Crystal Wafer Substrate , 3”, Prime Grade, Epi-Ready

N Type , GaSb Crystal Wafer Substrate , 3”, Prime Grade, Epi-Ready

  1. MOQ: 1-10,000pcs
  2. Price: By Case
  3. Get Latest Price
Payment Terms T/T
Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days
product name GaSb Substrate wafer
Conduction Type N Type
Dopant Tellurium
Grade Prime Grade
other name Gallium Antimonide Wafer
Wafer Diameter 3 inch
Brand Name PAM-XIAMEN
Place of Origin China

View Detail Information

Contact Now Ask for best deal
Get Latest Price Request a quote
  1. Product Details
  2. Company Details

Product Specification

Payment Terms T/T Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days product name GaSb Substrate wafer
Conduction Type N Type Dopant Tellurium
Grade Prime Grade other name Gallium Antimonide Wafer
Wafer Diameter 3 inch Brand Name PAM-XIAMEN
Place of Origin China
High Light gallium antimonide2 inch wafer

N Type , GaSb Crystal Wafer Substrate , 3”, Prime Grade, Epi-Ready
 
PAM-XIAMEN offers GaSb wafer – Gallium Antimonide which are grown by LEC(Liquid Encapsulated Czochralski) as epi-ready or mechanical grade with n type, p type or undoped in different orientation(111)or(100).Gallium antimonide (GaSb) is a crystalline compound made from the elements Gallium (Ga) and antimony (Sb).
 
3" GaSb Wafer Specification

ItemSpecifications
Conduction TypeN-type
DopantTellurium
Wafer Diameter3"
Wafer Orientation(100)±0.5°
Wafer Thickness600±25um
Primary Flat Length22±2mm
Secondary Flat Length11±1mm
Carrier Concentration(1-20)x1017cm-3
Mobility2000-3500cm2/V.s
EPD<2x103cm-2
TTV<12um
BOW<12um
WARP<15um
Laser markingupon request
Suface finishP/E, P/P
Epi readyyes
PackageSingle wafer container or cassette

Electrical properties of GaSb Wafer

Band structure and carrier concentration of GaSb Wafer include Basic Parameters,Mobility and Hall Effect,Transport Properties in High Electric Fields
,Impact Ionization,Recombination Parameters
 
Basic Parameters

Breakdown field≈5·104
Mobility electrons≤ 3000 cm2 V-1 s-1
Mobility holes≤ 1000 cm2 V-1 s-1
Diffusion coefficient electrons≤ 75 cm2/s
Diffusion coefficient holes≤ 25 cm2/s
Electron thermal velocity5.8·105 m/s
Hole thermal velocity2.1·105 m/s

Mobility and Hall Effect

Electron Hall mobility versus temperature for different doping levels.
1. Nd= 1.7·1018 cm-3
2. Nd= 2.8·1017 cm-3
Broken curves represent the experimental data. Continuous curves represent theoretical calculations.
 
Electron Hall mobility versus electron concentration no. T=77 K.
Open circles represent measurements with a group of samples having approximately the same residual acceptor concentrations Na. Full symbols:specimens with lower residual acceptor concentrations. Solid lines represent the theoretical calculations for different values of compensating acceptor densities - either singly (Na-) or doubly (Na--) ionized.
1. Na- = 1.2·1017 or Na-- = 0.4·1017 cm-3
2. Na- =2.85·1017 or Na-- =0.95·1017 cm-3
3. Na- = 4.5·1017 or Na-- = 1.5·1017 cm-3
 
Hole Hall mobility versus temperature at different compensation levels.
1. Na= 1.39·1017 cm-3; Nd= 9·1015 cm-3;
2. Na= 1.3·1017 cm-3; Nd= 9.5·1016 cm-3;
3. Na= 1.1·1017cm-3; Nd= 9.5·1016 cm-3
 
Temperature dependence of hole Hall mobility.
MBE technique. Hole concentration at 300 K:
1. - 2.28·1016 cm-3;
2. - 1.9·1019 cm-3.
 
The hole Hall mobility versus hole concentration, 300 K.
Experimental data are taken from five different papers

Transport Properties in High Electric Fields

Calculated field dependence of the electron drift velocity, 300 K.
 
Calculated (solid) end experimental (points) current density dependencies versus the electric field, 300 K.
 
Fraction of electrons in Γ, L, X valleys as a function of electric field,300 K
n=6.8·1016 cm-3
 
Electron temperature as a function of the electric field, T=77 K.
full and open circle - experimental data
curve are calculated

Impact Ionization

The dependences of αi and βi> versus 1/F. T=77 K
Open symbols : F (111).
Filled symbols : F (100).
 
The dependences of αi and βi versus 1/F). T=300 K
F (100).
 

Recombination Parameters

Radiative lifetime versus donor concentration, T =77 K, GaSb(Te).
To extract these dependences from experimental data the values of internal quantum efficiency η were taken:
open circles η=0.8;
filled circles η=1;
 
Nonradiative lifetime versus donor concentrations, T =77K, GaSb(Te).
open circles η= 0.8;
filled circles η= 1; (Agaev et al. [1984]).
Electron radiative (triangles) and nonradiative (squares) lifetime versus acceptor concentration, p-GaSb, T=77 K.
 
Electron lifetime versus temperature at different acceptor concentrations.
Na (cm-3): 1. 5·1018; 2. 2.2·1019; 3. 3.5·1019.
 

 

Radiative recombination coefficient~10-10 cm3 s-1
Auger coefficient 
77K2·10-29 cm6s-1
300 K5·10-30 cm6s-1

 
Are You Looking for an GaSb Wafer?
PAM-XIAMEN is your go-to place for everything wafers, including GaSb wafers, as we have been doing it for almost 30 years! Enquire us today to learn more about the wafers that we offer and how we can help you with your next project. Our group team is looking forward to providing both quality products and excellent service for you!
















































Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Exporter,Seller

  • Year Established:

    1990

  • Total Annual:

    10 Million-50 Million

  • Employee Number:

    50~100

  • Ecer Certification:

    Active Member

  Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...   Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...

+ Read More

Get in touch with us

  • Reach Us
  • XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
  • #506B, Henghui Business Center, No.77, Lingxia Nan Road, High Technology Zone, Huli, Xiamen 361006, China
  • http://www.ganwafer.com/

Leave a Message, we will call you back quickly!

Email

Check your email

Phone Number

Check your phone number

Requirement Details

Your message must be between 20-3,000 characters!

Submit Requirement