Payment Terms | T/T |
Supply Ability | 10,000 wafers/month |
Delivery Time | 5-50 working days |
name | SIC Wafer |
Grade | Dummy Grade |
Description | 6H N Type SIC Wafer |
Carrier Type | N Type |
Diameter | (50.8 ± 0.38) mm |
Thickness | (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm |
Brand Name | PAM-XIAMEN |
Place of Origin | China |
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Product Specification
Payment Terms | T/T | Supply Ability | 10,000 wafers/month |
Delivery Time | 5-50 working days | name | SIC Wafer |
Grade | Dummy Grade | Description | 6H N Type SIC Wafer |
Carrier Type | N Type | Diameter | (50.8 ± 0.38) mm |
Thickness | (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm | Brand Name | PAM-XIAMEN |
Place of Origin | China | ||
High Light | silicon carbide wafer ,4h sic wafer |
6H N Type SiC Wafer, Dummy Grade,2”Size -SiC Wafer Supplier
PAM-XIAMEN offers semiconductor silicon carbide wafers,6H SiC and 4H SiC in different quality grades for researcher and industry manufacturers. We has developed SiC crystal growth technology and SiC crystal wafer processing technology,established a production line to manufacturer SiCsubstrate,Which is applied in GaNepitaxydevice,powerdevices,high-temperature device and optoelectronic Devices. As a professional company invested by the leading manufacturers from the fields of advanced and high-tech material research and state institutes and China’s Semiconductor Lab,weare devoted to continuously improve the quality of currently substrates and develop large size substrates.
Here shows detail specification
SILICON CARBIDE MATERIAL PROPERTIES
Polytype | Single Crystal 4H | Single Crystal 6H |
Lattice Parameters | a=3.076 Å | a=3.073 Å |
c=10.053 Å | c=15.117 Å | |
Stacking Sequence | ABCB | ABCACB |
Band-gap | 3.26 eV | 3.03 eV |
Density | 3.21 · 103 kg/m3 | 3.21 · 103 kg/m3 |
Therm. Expansion Coefficient | 4-5×10-6/K | 4-5×10-6/K |
Refraction Index | no = 2.719 | no = 2.707 |
ne = 2.777 | ne = 2.755 | |
Dielectric Constant | 9.6 | 9.66 |
Thermal Conductivity | 490 W/mK | 490 W/mK |
Break-Down Electrical Field | 2-4 · 108 V/m | 2-4 · 108 V/m |
Saturation Drift Velocity | 2.0 · 105 m/s | 2.0 · 105 m/s |
Electron Mobility | 800 cm2/V·S | 400 cm2/V·S |
hole Mobility | 115 cm2/V·S | 90 cm2/V·S |
Mohs Hardness | ~9 | ~9 |
6H N Type SiC Wafer, Dummy Grade,2”Size
SUBSTRATE PROPERTY | S6H-51-N-PWAM-250 S6H-51-N-PWAM-330 S6H-51-N-PWAM-430 |
Description | Dummy Grade 6H SiC Substrate |
Polytype | 6H |
Diameter | (50.8 ± 0.38) mm |
Thickness | (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm |
Carrier Type | n-type |
Dopant | Nitrogen |
Resistivity (RT) | 0.02 ~ 0.1 Ω·cm |
Surface Roughness | < 0.5 nm (Si-face CMP Epi-ready); <1 nm (C- face Optical polish) |
FWHM | <50 arcsec |
Micropipe Density | A+≤1cm-2 A≤10cm-2 B≤30cm-2 C≤50cm-2 D≤100cm-2 |
Surface Orientation | |
On axis | <0001>± 0.5° |
Off axis | 3.5° toward <11-20>± 0.5° |
Primary flat orientation | Parallel {1-100} ± 5° |
Primary flat length | 16.00 ± 1.70 mm |
Secondary flat orientation | Si-face:90° cw. from orientation flat ± 5° |
C-face:90° ccw. from orientation flat ± 5° | |
Secondary flat length | 8.00 ± 1.70 mm |
Surface Finish | Single or double face polished |
Packaging | Single wafer box or multi wafer box |
Usable area | ≥ 90 % |
Edge exclusion | 1 mm |
Single crystal SiC Properties
Here we compare property of Silicon Carbide, including Hexagonal SiC,CubicSiC,Single crystal SiC.
Property of Silicon Carbide (SiC)
Comparision of Property of Silicon Carbide, including Hexagonal SiC,Cubic SiC,Single crystal SiC:
Property | Value | Conditions |
Density | 3217 kg/m^3 | hexagonal |
Density | 3210 kg/m^3 | cubic |
Density | 3200 kg/m^3 | Single crystal |
Hardness,Knoop(KH) | 2960 kg/mm/mm | 100g,Ceramic,black |
Hardness,Knoop(KH) | 2745 kg/mm/mm | 100g,Ceramic,green |
Hardness,Knoop(KH) | 2480 kg/mm/mm | Single crystal. |
Young's Modulus | 700 GPa | Single crystal. |
Young's Modulus | 410.47 GPa | Ceramic,density=3120 kg/m/m/m, at room temperature |
Young's Modulus | 401.38 GPa | Ceramic,density=3128 kg/m/m/m, at room temperature |
Thermal conductivity | 350 W/m/K | Single crystal. |
Yield strength | 21 GPa | Single crystal. |
Heat capacity | 1.46 J/mol/K | Ceramic,at temp=1550 C. |
Heat capacity | 1.38 J/mol/K | Ceramic,at temp=1350 C. |
Heat capacity | 1.34 J/mol/K | Ceramic,at temp=1200 C. |
Heat capacity | 1.25 J/mol/K | Ceramic,at temp=1000 C. |
Heat capacity | 1.13 J/mol/K | Ceramic,at temp=700 C. |
Heat capacity | 1.09 J/mol/K | Ceramic,at temp=540 C. |
Electrical resistivity | 1 .. 1e+10 Ω*m | Ceramic,at temp=20 C |
Compressive strength | 0.5655 .. 1.3793 GPa | Ceramic,at temp=25 C |
Modulus of Rupture | 0.2897 GPa | Ceramic,with 1 wt% B addictive |
Modulus of Rupture | 0.1862 GPa | Ceramifc,at room temperature |
Poisson's Ratio | 0.183 .. 0.192 | Ceramic,at room temperature,density=3128 kg/m/m/m |
Modulus of Rupture | 0.1724 GPa | Ceramic,at temp=1300 C |
Modulus of Rupture | 0.1034 GPa | Ceramic,at temp=1800 C |
Modulus of Rupture | 0.07586 GPa | Ceramic,at temp=1400 C |
Tensile strength | 0.03448 .. 0.1379 GPa | Ceramic,at temp=25 C |
*Reference:CRC Materials Science and Engineering Handbook
Comparision of Property of single crystal SiC, 6H and 4H:
Property | Single Crystal 4H | Single Crystal 6H |
Lattice Parameters | a=3.076 Å | a=3.073 Å |
c=10.053 Å | c=15.117 Å | |
Stacking Sequence | ABCB | ABCACB |
Band-gap | 3.26 eV | 3.03 eV |
Density | 3.21 · 103 kg/m3 | 3.21 · 103 kg/m3 |
Therm. Expansion Coefficient | 4-5×10-6/K | 4-5×10-6/K |
Refraction Index | no = 2.719 | no = 2.707 |
ne = 2.777 | ne = 2.755 | |
Dielectric Constant | 9.6 | 9.66 |
Thermal Conductivity | 490 W/mK | 490 W/mK |
Break-Down Electrical Field | 2-4 · 108 V/m | 2-4 · 108 V/m |
Saturation Drift Velocity | 2.0 · 105 m/s | 2.0 · 105 m/s |
Electron Mobility | 800 cm2/V·S | 400 cm2/V·S |
hole Mobility | 115 cm2/V·S | 90 cm2/V·S |
Mohs Hardness | ~9 | ~9 |
*Reference:Xiamen Powerway Advanced Material Co.,Ltd.
Comparision of property of 3C-SiC,4H-SiC and 6H-SiC:
Si-C Polytype | 3C-SiC | 4H-SiC | 6H-SiC | |
Crystal structure | Zinc blende (cubic) | Wurtzite ( Hexagonal) | Wurtzite ( Hexagonal) | |
Group of symmetry | T2d-F43m | C46v-P63mc | C46v-P63mc | |
Bulk modulus | 2.5 x 1012 dyn cm-2 | 2.2 x 1012 dyn cm-2 | 2.2 x 1012 dyn cm-2 | |
Linear thermal expansion coefficient | 2.77 (42) x 10-6 K-1 | |||
Debye temperature | 1200 K | 1300 K | 1200 K | |
Melting point | 3103 (40) K | 3103 ± 40 K | 3103 ± 40 K | |
Density | 3.166 g cm-3 | 3.21 g cm-3 | 3.211 g cm-3 | |
Hardness | 9.2-9.3 | 9.2-9.3 | 9.2-9.3 | |
Surface microhardness | 2900-3100 kg mm-2 | 2900-3100 kg mm-2 | 2900-3100 kg mm-2 | |
Dielectric constant (static) | ε0 ~= 9.72 | The value of 6H-SiC dielectric constant is usually used | ε0,ort ~= 9.66 | |
Infrared refractive index | ~=2.55 | ~=2.55 (c axis) | ~=2.55 (c axis) | |
Refractive index n(λ) | n(λ)~= 2.55378 + 3.417 x 104·λ-2 | n0(λ)~= 2.5610 + 3.4 x 104·λ-2 | n0(λ)~= 2.55531 + 3.34 x 104·λ-2 | |
ne(λ)~= 2.6041 + 3.75 x 104·λ-2 | ne(λ)~= 2.5852 + 3.68 x 104·λ-2 | |||
Radiative recombination coefficient | 1.5 x 10-12 cm3/s | 1.5 x 10-12 cm3/s | ||
Optical photon energy | 102.8 meV | 104.2 meV | 104.2 meV | |
Effective electron mass (longitudinal)ml | 0.68mo | 0.677(15)mo | 0.29mo | |
Effective electron mass (transverse)mt | 0.25mo | 0.247(11)mo | 0.42mo | |
Effective mass of density of states mcd | 0.72mo | 0.77mo | 2.34mo | |
Effective mass of the density of states in one valley of conduction band mc | 0.35mo | 0.37mo | 0.71mo | |
Effective mass of conductivity mcc | 0.32mo | 0.36mo | 0.57mo | |
Effective hall mass of density of state mv? | 0.6 mo | ~1.0 mo | ~1.0 mo | |
Lattice constant | a=4.3596 A | a = 3.0730 A | a = 3.0730 A | |
b = 10.053 | b = 10.053 |
*Reference: IOFFE
SiC 4H and SiC 6H manufacturer reference:PAM-XIAMEN is the world’s leading developer of solid-state lighting technology,he offer a full line: Sinlge crystal SiC wafer and epitaxial wafer and SiC wafer reclaim.
Thermal Expansion Coefficient:
Thermal expansion is the tendency of matter to change in volume in response to a change in temperature.
When a substance is heated, its particles begin moving more and thus usually maintain a greater average separation. Materials which contract with increasing temperature are rare; this effect is limited in size, and only occurs within limited temperature ranges (see examples below). The degree of expansion divided by the change in temperature is called the material's coefficient of thermal expansion and generally varies with temperature.
The coefficient of thermal expansion describes how the size of an object changes with a change in temperature. Specifically, it measures the fractional change in size per degree change in temperature at a constant pressure. Several types of coefficients have been developed: volumetric, area, and linear. Which is used depends on the particular application and which dimensions are considered important. For solids, one might only be concerned with the change along a length, or over some area.
The volumetric thermal expansion coefficient is the most basic thermal expansion coefficient. In general, substances expand or contract when their temperature changes, with expansion or contraction occurring in all directions. Substances that expand at the same rate in every direction are called isotropic. For isotropic materials, the area and linear coefficients may be calculated from the volumetric coefficient.
Mathematical definitions of these coefficients are defined below for solids, liquids, and gasses.
General volumetric thermal expansion coefficient In the general case of a gas, liquid, or solid, the volumetric coefficient of thermal expansion is given by
The subscript p indicates that the pressure is held constant during the expansion, and the subscript "V" stresses that it is the volumetric (not linear) expansion that enters this general definition. In the case of a gas, the fact that the pressure is held constant is important, because the volume of a gas will vary appreciably with pressure as well as temperature. For a gas of low density this can be seen from the ideal gas law.
Company Details
Business Type:
Manufacturer,Exporter,Seller
Year Established:
1990
Total Annual:
10 Million-50 Million
Employee Number:
50~100
Ecer Certification:
Active Member
Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai... Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...
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