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XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.

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China 6H N Type SiC Wafer, Dummy Grade,2”Size -SiC Wafer Supplier
China 6H N Type SiC Wafer, Dummy Grade,2”Size -SiC Wafer Supplier

  1. China 6H N Type SiC Wafer, Dummy Grade,2”Size -SiC Wafer Supplier

6H N Type SiC Wafer, Dummy Grade,2”Size -SiC Wafer Supplier

  1. MOQ: 1-10,000pcs
  2. Price: By Case
  3. Get Latest Price
Payment Terms T/T
Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days
name SIC Wafer
Grade Dummy Grade
Description 6H N Type SIC Wafer
Carrier Type N Type
Diameter (50.8 ± 0.38) mm
Thickness (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm
Brand Name PAM-XIAMEN
Place of Origin China

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Product Specification

Payment Terms T/T Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days name SIC Wafer
Grade Dummy Grade Description 6H N Type SIC Wafer
Carrier Type N Type Diameter (50.8 ± 0.38) mm
Thickness (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm Brand Name PAM-XIAMEN
Place of Origin China
High Light silicon carbide wafer4h sic wafer

 

6H N Type SiC Wafer, Dummy Grade,2”Size -SiC Wafer Supplier

 

PAM-XIAMEN offers semiconductor silicon carbide wafers,6H SiC and 4H SiC in different quality grades for researcher and industry manufacturers. We has developed SiC crystal growth technology and SiC crystal wafer processing technology,established a production line to manufacturer SiCsubstrate,Which is applied in GaNepitaxydevice,powerdevices,high-temperature device and optoelectronic Devices. As a professional company invested by the leading manufacturers from the fields of advanced and high-tech material research and state institutes and China’s Semiconductor Lab,weare devoted to continuously improve the quality of currently substrates and develop large size substrates.

Here shows detail specification

 

SILICON CARBIDE MATERIAL PROPERTIES

 

Polytype Single Crystal 4H Single Crystal 6H
Lattice Parameters a=3.076 Å a=3.073 Å
  c=10.053 Å c=15.117 Å
Stacking Sequence ABCB ABCACB
Band-gap 3.26 eV 3.03 eV
Density 3.21 · 103 kg/m3 3.21 · 103 kg/m3
Therm. Expansion Coefficient 4-5×10-6/K 4-5×10-6/K
Refraction Index no = 2.719 no = 2.707
  ne = 2.777 ne = 2.755
Dielectric Constant 9.6 9.66
Thermal Conductivity 490 W/mK 490 W/mK
Break-Down Electrical Field 2-4 · 108 V/m 2-4 · 108 V/m
Saturation Drift Velocity 2.0 · 105 m/s 2.0 · 105 m/s
Electron Mobility 800 cm2/V·S 400 cm2/V·S
hole Mobility 115 cm2/V·S 90 cm2/V·S
Mohs Hardness ~9 ~9

 

6H N Type SiC Wafer, Dummy Grade,2”Size

 

 

SUBSTRATE PROPERTY S6H-51-N-PWAM-250 S6H-51-N-PWAM-330 S6H-51-N-PWAM-430
Description Dummy Grade 6H SiC Substrate
Polytype 6H
Diameter (50.8 ± 0.38) mm
Thickness (250 ± 25) μm (330 ± 25) μm (430 ± 25) μm
Carrier Type n-type
Dopant Nitrogen
Resistivity (RT) 0.02 ~ 0.1 Ω·cm
Surface Roughness < 0.5 nm (Si-face CMP Epi-ready); <1 nm (C- face Optical polish)
FWHM <50 arcsec
Micropipe Density A+≤1cm-2 A≤10cm-2 B≤30cm-2 C≤50cm-2 D≤100cm-2
Surface Orientation
On axis <0001>± 0.5°
Off axis 3.5° toward <11-20>± 0.5°
Primary flat orientation Parallel {1-100} ± 5°
Primary flat length 16.00 ± 1.70 mm
Secondary flat orientation Si-face:90° cw. from orientation flat ± 5°
C-face:90° ccw. from orientation flat ± 5°
Secondary flat length 8.00 ± 1.70 mm
Surface Finish Single or double face polished
Packaging Single wafer box or multi wafer box
Usable area ≥ 90 %
Edge exclusion 1 mm

 

Single crystal SiC Properties

Here we compare property of Silicon Carbide, including Hexagonal SiC,CubicSiC,Single crystal SiC.

Property of Silicon Carbide (SiC)

Comparision of Property of Silicon Carbide, including Hexagonal SiC,Cubic SiC,Single crystal SiC:

Property Value Conditions
Density 3217 kg/m^3 hexagonal
Density 3210 kg/m^3 cubic
Density 3200 kg/m^3 Single crystal
Hardness,Knoop(KH) 2960 kg/mm/mm 100g,Ceramic,black
Hardness,Knoop(KH) 2745 kg/mm/mm 100g,Ceramic,green
Hardness,Knoop(KH) 2480 kg/mm/mm Single crystal.
Young's Modulus 700 GPa Single crystal.
Young's Modulus 410.47 GPa Ceramic,density=3120 kg/m/m/m, at room temperature
Young's Modulus 401.38 GPa Ceramic,density=3128 kg/m/m/m, at room temperature
Thermal conductivity 350 W/m/K Single crystal.
Yield strength 21 GPa Single crystal.
Heat capacity 1.46 J/mol/K Ceramic,at temp=1550 C.
Heat capacity 1.38 J/mol/K Ceramic,at temp=1350 C.
Heat capacity 1.34 J/mol/K Ceramic,at temp=1200 C.
Heat capacity 1.25 J/mol/K Ceramic,at temp=1000 C.
Heat capacity 1.13 J/mol/K Ceramic,at temp=700 C.
Heat capacity 1.09 J/mol/K Ceramic,at temp=540 C.
Electrical resistivity 1 .. 1e+10 Ω*m Ceramic,at temp=20 C
Compressive strength 0.5655 .. 1.3793 GPa Ceramic,at temp=25 C
Modulus of Rupture 0.2897 GPa Ceramic,with 1 wt% B addictive
Modulus of Rupture 0.1862 GPa Ceramifc,at room temperature
Poisson's Ratio 0.183 .. 0.192 Ceramic,at room temperature,density=3128 kg/m/m/m
Modulus of Rupture 0.1724 GPa Ceramic,at temp=1300 C
Modulus of Rupture 0.1034 GPa Ceramic,at temp=1800 C
Modulus of Rupture 0.07586 GPa Ceramic,at temp=1400 C
Tensile strength 0.03448 .. 0.1379 GPa Ceramic,at temp=25 C

*Reference:CRC Materials Science and Engineering Handbook

 

Comparision of Property of single crystal SiC, 6H and 4H:

Property Single Crystal 4H Single Crystal 6H
Lattice Parameters a=3.076 Å a=3.073 Å
c=10.053 Å c=15.117 Å
Stacking Sequence ABCB ABCACB
Band-gap 3.26 eV 3.03 eV
Density 3.21 · 103 kg/m3 3.21 · 103 kg/m3
Therm. Expansion Coefficient 4-5×10-6/K 4-5×10-6/K
Refraction Index no = 2.719 no = 2.707
ne = 2.777 ne = 2.755
Dielectric Constant 9.6 9.66
Thermal Conductivity 490 W/mK 490 W/mK
Break-Down Electrical Field 2-4 · 108 V/m 2-4 · 108 V/m
Saturation Drift Velocity 2.0 · 105 m/s 2.0 · 105 m/s
Electron Mobility 800 cm2/V·S 400 cm2/V·S
hole Mobility 115 cm2/V·S 90 cm2/V·S
Mohs Hardness ~9 ~9

*Reference:Xiamen Powerway Advanced Material Co.,Ltd.

 

Comparision of property of 3C-SiC,4H-SiC and 6H-SiC:

Si-C Polytype 3C-SiC 4H-SiC 6H-SiC  
Crystal structure Zinc blende (cubic) Wurtzite ( Hexagonal) Wurtzite ( Hexagonal)  
Group of symmetry T2d-F43m C46v-P63mc C46v-P63mc  
Bulk modulus 2.5 x 1012 dyn cm-2 2.2 x 1012 dyn cm-2 2.2 x 1012 dyn cm-2  
Linear thermal expansion coefficient 2.77 (42) x 10-6 K-1      
Debye temperature 1200 K 1300 K 1200 K  
Melting point 3103 (40) K 3103 ± 40 K 3103 ± 40 K  
Density 3.166 g cm-3 3.21 g cm-3 3.211 g cm-3  
Hardness 9.2-9.3 9.2-9.3 9.2-9.3  
Surface microhardness 2900-3100 kg mm-2 2900-3100 kg mm-2 2900-3100 kg mm-2  
Dielectric constant (static) ε0 ~= 9.72 The value of 6H-SiC dielectric constant is usually used ε0,ort ~= 9.66  
Infrared refractive index ~=2.55 ~=2.55 (c axis) ~=2.55 (c axis)  
Refractive index n(λ) n(λ)~= 2.55378 + 3.417 x 104·λ-2 n0(λ)~= 2.5610 + 3.4 x 104·λ-2 n0(λ)~= 2.55531 + 3.34 x 104·λ-2  
ne(λ)~= 2.6041 + 3.75 x 104·λ-2 ne(λ)~= 2.5852 + 3.68 x 104·λ-2  
Radiative recombination coefficient   1.5 x 10-12 cm3/s 1.5 x 10-12 cm3/s  
Optical photon energy 102.8 meV 104.2 meV 104.2 meV  
Effective electron mass (longitudinal)ml 0.68mo 0.677(15)mo 0.29mo  
 
Effective electron mass (transverse)mt 0.25mo 0.247(11)mo 0.42mo  
 
Effective mass of density of states mcd 0.72mo 0.77mo 2.34mo  
Effective mass of the density of states in one valley of conduction band mc 0.35mo 0.37mo 0.71mo  
 
Effective mass of conductivity mcc 0.32mo 0.36mo 0.57mo  
Effective hall mass of density of state mv? 0.6 mo ~1.0 mo ~1.0 mo  
Lattice constant a=4.3596 A a = 3.0730 A a = 3.0730 A  
b = 10.053 b = 10.053  

*Reference: IOFFE

SiC 4H and SiC 6H manufacturer reference:PAM-XIAMEN is the world’s leading developer of solid-state lighting technology,he offer a full line: Sinlge crystal SiC wafer and epitaxial wafer and SiC wafer reclaim.

 

 

Thermal Expansion Coefficient:


Thermal expansion is the tendency of matter to change in volume in response to a change in temperature.
When a substance is heated, its particles begin moving more and thus usually maintain a greater average separation. Materials which contract with increasing temperature are rare; this effect is limited in size, and only occurs within limited temperature ranges (see examples below). The degree of expansion divided by the change in temperature is called the material's coefficient of thermal expansion and generally varies with temperature.

The coefficient of thermal expansion describes how the size of an object changes with a change in temperature. Specifically, it measures the fractional change in size per degree change in temperature at a constant pressure. Several types of coefficients have been developed: volumetric, area, and linear. Which is used depends on the particular application and which dimensions are considered important. For solids, one might only be concerned with the change along a length, or over some area.
The volumetric thermal expansion coefficient is the most basic thermal expansion coefficient. In general, substances expand or contract when their temperature changes, with expansion or contraction occurring in all directions. Substances that expand at the same rate in every direction are called isotropic. For isotropic materials, the area and linear coefficients may be calculated from the volumetric coefficient.

Mathematical definitions of these coefficients are defined below for solids, liquids, and gasses.

General volumetric thermal expansion coefficient In the general case of a gas, liquid, or solid, the volumetric coefficient of thermal expansion is given by

The subscript p indicates that the pressure is held constant during the expansion, and the subscript "V" stresses that it is the volumetric (not linear) expansion that enters this general definition. In the case of a gas, the fact that the pressure is held constant is important, because the volume of a gas will vary appreciably with pressure as well as temperature. For a gas of low density this can be seen from the ideal gas law.

 

Company Details

Bronze Gleitlager

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Bronze Sleeve Bushings

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Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer,Exporter,Seller

  • Year Established:

    1990

  • Total Annual:

    10 Million-50 Million

  • Employee Number:

    50~100

  • Ecer Certification:

    Active Member

  Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...   Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...

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  • XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
  • #506B, Henghui Business Center, No.77, Lingxia Nan Road, High Technology Zone, Huli, Xiamen 361006, China
  • http://www.ganwafer.com/

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