Payment Terms | T/T |
Supply Ability | 10,000 wafers/month |
Delivery Time | 5-50 working days |
Packaging Details | Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere |
product name | InAs Substrate Indium Arsenide Wafer |
Wafer Diamter | 3 inch |
Conduction Type | N Type |
Grade | Dummy Grade |
Wafer Thickness | 600±25um |
keyword | single crystal Indium arsenide Wafer |
Brand Name | PAM-XIAMEN |
Place of Origin | China |
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Product Specification
Payment Terms | T/T | Supply Ability | 10,000 wafers/month |
Delivery Time | 5-50 working days | Packaging Details | Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere |
product name | InAs Substrate Indium Arsenide Wafer | Wafer Diamter | 3 inch |
Conduction Type | N Type | Grade | Dummy Grade |
Wafer Thickness | 600±25um | keyword | single crystal Indium arsenide Wafer |
Brand Name | PAM-XIAMEN | Place of Origin | China |
High Light | indium arsenide wafer ,3 inch wafer |
N Type , InAs( Indium Arsenide ) Substrate , 3”, Dummy Grade
PAM-XIAMEN manufactures high purity single crystal Indium arsenide Wafers for optoelectronics applications. Our standard wafer diameters range from 25.4 mm (1 inch) to 100 mm (6 inches) in size; wafers can be produced in various thicknesses and orientations with polished or unpolished sides and can include dopants. PAM-XIAMEN can produce wide range grades: prime grade, mechanical grade,test grade, dummy grade, technical grade, and optical grade. PAM-XIAMEN also offers materials to customer specifications by request, in addition to custom compositions for commercial and research applications and new proprietary technologies.
3" InAs Wafer Specification
Item | Specifications | |
Dopant | Stannum | Sulphur |
Conduction Type | N-type | N-type |
Wafer Diameter | 3" | |
Wafer Orientation | (100)±0.5° | |
Wafer Thickness | 600±25um | |
Primary Flat Length | 22±2mm | |
Secondary Flat Length | 11±1mm | |
Carrier Concentration | (5-20)x1017cm-3 | (1-10)x1017cm-3 |
Mobility | 7000-20000cm2/V.s | 6000-20000cm2/V.s |
EPD | <5x104cm-2 | <3x104cm-2 |
TTV | <12um | |
BOW | <12um | |
WARP | <15um | |
Laser marking | upon request | |
Suface finish | P/E, P/P | |
Epi ready | yes | |
Package | Single wafer container or cassette |
What is InAs wafer?
Indium arsenide is a kind of III-V compound semiconductor material composed of indium and arsenic.It is a silver gray solid with a sphalerite crystal structure at room temperature. The lattice constant is 0.6058nm, and the density is 5.66g/cm (solid) and 5.90g/cm (liquid at melting point). The band structure is a direct transition with a band gap (300K) of 0.45ev. the dissociation pressure of as is only 0.033mpa, and the single crystal can be grown from the melt at atmospheric pressure. The commonly used methods are Hb and LEC. InAs is a kind of semiconductor material which is difficult to purify. The residual carrier concentration is higher than l × 10 / cm, the room temperature electron mobility is 3.3 × 10 ^ 3cm / (V · s), and the hole mobility is 460cm / (V · s). The effective segregation coefficient of sulfur in In and As is close to 1, so it is used as n-type dopant to improve the uniformity of longitudinal carrier concentration distribution. For industrial InAs (s) single crystal, n ≥ 1 × 10 / cm3, μ ≤ 2.0 × 10cm / (V · s), EPD ≤ 5 × 10 / cm3.
InAs crystal has high electron mobility and mobility ratio (μ E / μ H = 70), low magneto resistance effect and low resistance temperature coefficient. It is an ideal material for manufacturing Hall devices and magneto resistance devices. The emission wavelength of InAs is 3.34 μ M. in GaAs B, InAsPSb and inasb multiple epitaxial materials with lattice matching can be grown on InAs substrate. Lasers and detectors for optical fiber communication at 2-4 μ M band can be manufactured.
Infrared refractive index | ≈3.51 (300 K) |
Radiative recombination coefficient | 1.1·10-10 cm3/s |
Long-wave TO phonon energy hνTO | ≈27 meV (300 K) |
Long-wave LO phonon energy hνLO | ≈29 meV (300 K) |
![]() | Refractive index n versus photon energy. Solid curve is theoretical calculation. Points represent experimental data, 300 K. |
For 3.75 µm < λ < 33 µm
n = [11.1 + 0.71/(1-6.5·λ-2) + 2.75/(1-2085·λ-2) - 6·10-4·λ2)]1/2,
where λ is the wavelength in µn (300 K)
![]() | Normal incidence reflectivity versus photon energy, 300 K |
![]() | Absorption coefficient near the intrinsic absorption edge for n-InAs. T=4.2 K |
![]() | Absorption coefficient versus photon energy for different donor concentration, 300 K n (cm-3): 1. 3.6·1016, 2. 6·1017, 3. 3.8·1018. |
A ground state Rydberg energy RX1= 3.5 meV
![]() | Absorption coefficient versus photon energy, T = 300 K |
![]() | Free carrier absorption versus wavelength at different electron concentrations. T=300 K. no (cm-3): 1. 3.9·1018; 2. 7.8·1017; 3. 2.5·1017; 4. 2.8·1016; |
Are You Looking for an InAs substrate?
PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InAs wafers, send us enquiry today to learn more about how we can work with you to get you the InAs wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!
Company Details
Business Type:
Manufacturer,Exporter,Seller
Year Established:
1990
Total Annual:
10 Million-50 Million
Employee Number:
50~100
Ecer Certification:
Active Member
Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai... Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...
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