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XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.

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China N Type , InAs( Indium Arsenide ) Substrate , 3”, Dummy Grade
China N Type , InAs( Indium Arsenide ) Substrate , 3”, Dummy Grade

  1. China N Type , InAs( Indium Arsenide ) Substrate , 3”, Dummy Grade

N Type , InAs( Indium Arsenide ) Substrate , 3”, Dummy Grade

  1. MOQ: 1-10,000pcs
  2. Price:
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Payment Terms T/T
Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days
Packaging Details Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere
product name InAs Substrate Indium Arsenide Wafer
Wafer Diamter 3 inch
Conduction Type N Type
Grade Dummy Grade
Wafer Thickness 600±25um
keyword single crystal Indium arsenide Wafer
Brand Name PAM-XIAMEN
Place of Origin China

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  1. Product Details
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Product Specification

Payment Terms T/T Supply Ability 10,000 wafers/month
Delivery Time 5-50 working days Packaging Details Packaged in a class 100 clean room environment, in single container, under a nitrogen atmosphere
product name InAs Substrate Indium Arsenide Wafer Wafer Diamter 3 inch
Conduction Type N Type Grade Dummy Grade
Wafer Thickness 600±25um keyword single crystal Indium arsenide Wafer
Brand Name PAM-XIAMEN Place of Origin China
High Light indium arsenide wafer3 inch wafer

N Type , InAs( Indium Arsenide ) Substrate , 3”, Dummy Grade

 

PAM-XIAMEN manufactures high purity single crystal Indium arsenide Wafers for optoelectronics applications. Our standard wafer diameters range from 25.4 mm (1 inch) to 100 mm (6 inches) in size; wafers can be produced in various thicknesses and orientations with polished or unpolished sides and can include dopants. PAM-XIAMEN can produce wide range grades: prime grade, mechanical grade,test grade, dummy grade, technical grade, and optical grade. PAM-XIAMEN also offers materials to customer specifications by request, in addition to custom compositions for commercial and research applications and new proprietary technologies.

 

3" InAs Wafer Specification

Item Specifications
Dopant Stannum Sulphur
Conduction Type N-type N-type
Wafer Diameter 3"
Wafer Orientation (100)±0.5°
Wafer Thickness 600±25um
Primary Flat Length 22±2mm
Secondary Flat Length 11±1mm
Carrier Concentration (5-20)x1017cm-3 (1-10)x1017cm-3
Mobility 7000-20000cm2/V.s 6000-20000cm2/V.s
EPD <5x104cm-2 <3x104cm-2
TTV <12um
BOW <12um
WARP <15um
Laser marking upon request
Suface finish P/E, P/P
Epi ready yes
Package Single wafer container or cassette

 

What is InAs wafer?

Indium arsenide is a kind of III-V compound semiconductor material composed of indium and arsenic.It is a silver gray solid with a sphalerite crystal structure at room temperature. The lattice constant is 0.6058nm, and the density is 5.66g/cm (solid) and 5.90g/cm (liquid at melting point). The band structure is a direct transition with a band gap (300K) of 0.45ev. the dissociation pressure of as is only 0.033mpa, and the single crystal can be grown from the melt at atmospheric pressure. The commonly used methods are Hb and LEC. InAs is a kind of semiconductor material which is difficult to purify. The residual carrier concentration is higher than l × 10 / cm, the room temperature electron mobility is 3.3 × 10 ^ 3cm / (V · s), and the hole mobility is 460cm / (V · s). The effective segregation coefficient of sulfur in In and As is close to 1, so it is used as n-type dopant to improve the uniformity of longitudinal carrier concentration distribution. For industrial InAs (s) single crystal, n ≥ 1 × 10 / cm3, μ ≤ 2.0 × 10cm / (V · s), EPD ≤ 5 × 10 / cm3.

 

InAs crystal has high electron mobility and mobility ratio (μ E / μ H = 70), low magneto resistance effect and low resistance temperature coefficient. It is an ideal material for manufacturing Hall devices and magneto resistance devices. The emission wavelength of InAs is 3.34 μ M. in GaAs B, InAsPSb and inasb multiple epitaxial materials with lattice matching can be grown on InAs substrate. Lasers and detectors for optical fiber communication at 2-4 μ M band can be manufactured.

Optical properties of InAs wafer

Infrared refractive index ≈3.51 (300 K)
Radiative recombination coefficient 1.1·10-10 cm3/s
Long-wave TO phonon energy hνTO ≈27 meV (300 K)
Long-wave LO phonon energy hνLO ≈29 meV (300 K)

 

Refractive index n versus photon energy.
Solid curve is theoretical calculation.
Points represent experimental data, 300 K.

For 3.75 µm < λ < 33 µm
n = [11.1 + 0.71/(1-6.5·λ-2) + 2.75/(1-2085·λ-2) - 6·10-4·λ2)]1/2,
where λ is the wavelength in µn (300 K)
 

Normal incidence reflectivity versus photon energy, 300 K
 
Absorption coefficient near the intrinsic absorption edge for n-InAs.
T=4.2 K
 
Absorption coefficient versus photon energy for different donor concentration, 300 K
n (cm-3): 1. 3.6·1016, 2. 6·1017, 3. 3.8·1018.
 

A ground state Rydberg energy RX1= 3.5 meV

Absorption coefficient versus photon energy, T = 300 K
 
Free carrier absorption versus wavelength at different electron concentrations. T=300 K.
no (cm-3): 1. 3.9·1018; 2. 7.8·1017; 3. 2.5·1017; 4. 2.8·1016;
 

 

Are You Looking for an InAs substrate?

PAM-XIAMEN is proud to offer indium phosphide substrate for all different kinds of projects. If you are looking for InAs wafers, send us enquiry today to learn more about how we can work with you to get you the InAs wafers you need for your next project. Our group team is looking forward to providing both quality products and excellent service for you!

 

Company Details

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 from Quality China Factory
  • Business Type:

    Manufacturer,Exporter,Seller

  • Year Established:

    1990

  • Total Annual:

    10 Million-50 Million

  • Employee Number:

    50~100

  • Ecer Certification:

    Active Member

  Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...   Xiamen Powerway Advanced Material Co.,Limited(PAM-XIAMEN) is a high-tech enterprise for compound semiconductor material integrating semiconductor crystal growth, process development and epitaxy, specializing in the research and production of compound semiconductor wafers, there are two mai...

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  • XIAMEN POWERWAY ADVANCED MATERIAL CO., LTD.
  • #506B, Henghui Business Center, No.77, Lingxia Nan Road, High Technology Zone, Huli, Xiamen 361006, China
  • http://www.ganwafer.com/

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