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China factory - Shanghai GaNova Electronic Information Co., Ltd.

Shanghai GaNova Electronic Information Co., Ltd.

  • China,Shanghai ,Shanghai
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China Single Crystal GaN Epitaxial Wafer 2inch C Face Un Doped N Type
China Single Crystal GaN Epitaxial Wafer 2inch C Face Un Doped N Type

  1. China Single Crystal GaN Epitaxial Wafer 2inch C Face Un Doped N Type

Single Crystal GaN Epitaxial Wafer 2inch C Face Un Doped N Type

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Payment Terms T/T
Supply Ability 10000pcs/month
Delivery Time 3-4 week days
Packaging Details Vacuum packing in a class 10000 clean room environment,in cassettes of 6pcs or single wafer containers.
Product Name 2-inch Free-standing U-GaN/SI-GaN Substrates
Dimensions 50.8 ± 1mm
Thickness 350 ± 25μm
Orientation flat (1-100) ± 0.5˚, 16 ± 1mm
Secondary orientation flat (11-20) ± 3˚, 8 ± 1mm
Ga face surface roughness < 0.2nm (polished) or < 0.3nm (polished and surface treatment for epitaxy)
Brand Name GaNova
Model Number JDCD01-001-019
Certification UKAS/ISO9001:2015
Place of Origin Suzhou China

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Product Specification

Payment Terms T/T Supply Ability 10000pcs/month
Delivery Time 3-4 week days Packaging Details Vacuum packing in a class 10000 clean room environment,in cassettes of 6pcs or single wafer containers.
Product Name 2-inch Free-standing U-GaN/SI-GaN Substrates Dimensions 50.8 ± 1mm
Thickness 350 ± 25μm Orientation flat (1-100) ± 0.5˚, 16 ± 1mm
Secondary orientation flat (11-20) ± 3˚, 8 ± 1mm Ga face surface roughness < 0.2nm (polished) or < 0.3nm (polished and surface treatment for epitaxy)
Brand Name GaNova Model Number JDCD01-001-019
Certification UKAS/ISO9001:2015 Place of Origin Suzhou China
High Light Single Crystal GaN Epitaxial WaferUn Doped ngle crystal waferGaN Epitaxial Wafer N Type

2inch C-face Un-doped n-type free-standing GaN single crystal substrate Resistivity < 0.1 Ω·cm Power device/laser wafer
 
Overview
High-quality GaN free-standing substrates with low dislocation density suitable for manufacturing laser diodes to be used as light sources for Blu-ray disc drives or projectors.
GaN Template on silicon is made by a hydride vapor phase epitaxy (HVPE)-based method. During the HVPE process, HCl reacts with molten Ga to form GaCl, which in turn reacts with NH3 to form GaN. GaN template on silicon is a cost effective way to replace GaN single crystal substrate.
 
 

2-inch Free-standing U-GaN/SI-GaN Substrates
 

 

Excellent level (S)

 

Production level(A)

Research

level (B)

Dummy

level (C)

2 Inch U GaN Substrates SI GaN Substrates 50.8mm 0

 

 

 

 

 

 

Note:

(1) Useable area: edge and macro defects exclusion

(2) 3 points: the miscut angles of positions (2, 4, 5) are 0.35 ± 0.15o

S-1 S-2 A-1 A-2
Dimensions 50.8 ± 1 mm
Thickness 350 ± 25 μm
Orientation flat (1-100) ± 0.5o, 16 ± 1 mm
Secondary orientation flat (11-20) ± 3o, 8 ± 1 mm
Resistivity (300K)

< 0.5 Ω·cm for N-type (Undoped; GaN-FS-C-U-C50)

or > 1 x 106 Ω·cm for Semi-insulating (Fe-doped; GaN-FS-C-SI-C50)

TTV ≤ 15 μm
BOW ≤ 20 μm ≤ 40 μm
Ga face surface roughness

< 0.2 nm (polished)

or < 0.3 nm (polished and surface treatment for epitaxy)

N face surface roughness

0.5 ~1.5 μm

option: 1~3 nm (fine ground); < 0.2 nm (polished)

Package Packaged in a cleanroom in single wafer container
Useable area > 90% >80% >70%
Dislocation density <9.9x105 cm-2 <3x106 cm-2 <9.9x105 cm-2 <3x106 cm-2 <3x106 cm-2
Orientation:C plane (0001) off angle toward M-axis

0.35 ± 0.15o

(3 points)

0.35 ± 0.15o

(3 points)

0.35 ± 0.15o

(3 points)

Macro defect density (hole) 0 cm-2 < 0.3 cm-2 < 1 cm-2
Max size of macro defects   < 700 μm < 2000 μm < 4000 μm

 

 
About Us
We specialize in processing a variety of materials into wafers, substrates and customized optical glass parts.components widely used in electronics, optics, opto electronics and many other fields. We also have been working closely with many domestic and oversea universities, research institutions and companies, provide customized products and services for their R&D projects. It's our vision to maintaining a good relationship of cooperation with our all customers by our good reputations.
 
 
FAQ
Q: Are you trading company or manufacturer ?
We are factory.
Q: How long is your delivery time?
Generally it is 3-5 days if the goods are in stock.
or it is 7-10 days if the goods are not in stock, it is according to quantity.
Q: Do you provide samples ? is it free or extra ?
Yes, we could offer the sample for free charge but do not pay the cost of freight.
Q: What is your terms of payment ?
Payment <=5000USD, 100% in advance.
Paymen >=5000USD, 80% T/T in advance , balance before shippment.

Company Details

Bronze Gleitlager

,

Bronze Sleeve Bushings

 and 

Graphite Plugged Bushings

 from Quality China Factory
  • Business Type:

    Manufacturer

  • Year Established:

    2020

  • Employee Number:

    >100

  • Ecer Certification:

    Verified Supplier

Shanghai GaNova Electronic Information Co., Ltd. is a company specialized in broadband semiconductor technology related materials, equipment, testing and analysis services and technical advice. Founded in 2020, we are a wholly-owned subsidiary of Suzhou Nanowin Technology Co., Ltd. Our team has prof... Shanghai GaNova Electronic Information Co., Ltd. is a company specialized in broadband semiconductor technology related materials, equipment, testing and analysis services and technical advice. Founded in 2020, we are a wholly-owned subsidiary of Suzhou Nanowin Technology Co., Ltd. Our team has prof...

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Get in touch with us

  • Reach Us
  • Shanghai GaNova Electronic Information Co., Ltd.
  • Building 11, Lane 1333, Jiangnan Avenue, Changxing Town, Chongming District, Shanghai
  • https://www.epi-wafers.com/

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